Omat Develops and Delivers Multi-Element Aluminum-Alloy High-Purity Semiconductor Target

After nearly two years of unremitting efforts by its R & D team, OLAI New Materials has carried out film composition design and target process development for customer application requirements. After multiple rounds of test optimization, a brand-new multi-component aluminum alloy high purity target for optoelectronic semiconductor field has been successfully developed and delivered smoothly.

The successful development and delivery of multi-element aluminum alloy high-purity targets not only demonstrates Omat Advanced Materialss 'innovative capabilities and technical strength in the field of high-performance sputtering targets, but also lays a solid foundation for its future market competition. foundation. In the future, Oolai New Materials will continue to increase investment in R & D, continue to launch more new products with independent intellectual property rights and market competitiveness, and make greater contributions to promoting the development of my country's sputtering target industry.