Ta Target

Tantalum sputtering target for Cu interconnect diffusion barrier

Ta Target

产品介绍

Tantalum sputtering target for semiconductor copper interconnect diffusion barrier layer.

技术参数

暂无技术参数数据

其他产品推荐

RECOMMENDED PRODUCTS

查看全部
High-Purity Cu Target

High-Purity Cu Target

High-purity copper sputtering target for IC interconnects, purity ≥99.99%, grain size ≤70μm

ITO Target

ITO Target

High-purity planar ITO target for TFT-LCD display

ITO PV Target

ITO PV Target

High-purity ITO sputtering target for solar cells

Ag Target

Ag Target

High-purity silver sputtering target for Low-E glass